紫外线臭氧清洗机使用 185 nm 和 254 nm 强紫外线对非酸性、干燥、非破坏性原子清洁和去除有机污染物非常有效。在氧气存在的情况下，185 线会产生臭氧，而 254 线会激发表面的有机分子。
主要功能及特色
紫外臭氧清洗机可组合利用紫外线、臭氧和加热，温和有效地从各种基材上去除 有机物，该系统适用多种应用，如基板清洗、光刻胶残渣清除，亲水性提高，表面活化和紫外光固化。
主要规格和技术参数
样品载物台最大可放置 8 寸硅片，向下兼容小尺寸样品。样品厚度不得超过8mm。设备最高温度不得超过300摄氏度。
Product Features:
Material: The whole body is made of stainless steel, which is resistant to acid and alkali, corrosion, and beautiful.
Structure: Drawer type sample table, easy and convenient to take and place the substrate
Airway: Reserved air intake interface to enrich the cleaning type of equipment
Protection: Drawer opening and closing interlock with UV light to avoid UV damage
Timing: Button timer, digital countdown, intuitive
Operation: The cleaning process can be manually terminated at any time.
Accessories: Optional ozone neutralizer to avoid ozone damage
Specification:
Sample Size: Up to 160mm x 200mm
Cleaning band: 185nm and 254nm
3-5mm average light intensity from UV lamp: 28~32mW/cm2
Lamp: Double tube low pressure mercury lamp
Adjustable illumination distance: 5~30mm
Timer working range: 0~99min99s with automatic countdown function
Heating range (Optional): From room temperature to 200 ℃
